期刊论文

中文

材料保护

1001-1560

2006

39

6

12-14

10.16577/j.cnki.42-1215/tb.2006.06.004

本校为第一机构

过去用电化学方法对硫酸型镀锢工艺、作用机理研究较少。采用循环伏安、线性电位扫描和交流阻抗等电化学方法，研究了硫酸型镀锢中的阴极反应机理。结果表明：该体系内锢电沉积的最佳pH值为2～3，最佳温度为35～45℃；该阴极过程中存在前置化学反应和随后两个不可逆电化学反应，其中第一个电化学反应是控制步骤，其阴极过程电极反应标准常数为8.188×10^（-10） cm／s。

The cathodic reaction mechanism of indium electroplating in a sulfate bath was investigated using several electrochemical methods such as cyclic volt-ampere measurement,linear voltage scanning,and electrochemical impedance spectroscopy.The results showed that the optimized pH value and temperature for the indium electrodeposition from the sulfate bath were 2~3 and 35~45 ℃,respectively.A preliminary chemical reaction and two non-reversible electrochemical reactions were involved in the cathodic process,and the first electrochemical reaction was...