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Two-point resistances in the generalized phenylenes

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成果类型:
期刊论文
作者:
Li, Qishun;Li, Shuchao*;Zhang, Leilei
通讯作者:
Li, Shuchao
作者机构:
[Li, Qishun] Beijing Jiaotong Univ, Sch Elect Engn, Beijing 100044, Peoples R China.
[Zhang, Leilei; Li, Shuchao] Huazhong Normal Univ, Sch Math & Stat, Wuhan 430079, Peoples R China.
通讯机构:
[Li, Shuchao] H
Huazhong Normal Univ, Sch Math & Stat, Wuhan 430079, Peoples R China.
语种:
英文
关键词:
Resistance distance;Generalized phenylenes;Asymptotic property
期刊:
Journal of Mathematical Chemistry
ISSN:
0259-9791
年:
2020
卷:
58
期:
9
页码:
1846-1873
机构署名:
本校为通讯机构
院系归属:
数学与统计学学院
摘要:
The resistance between two nodes in some electronic networks has been studied extensively. Let G(n) be a generalized phenylene with n 6-cycles and n 4-cycles. Using series and parallel rules and the Delta - Y transformations we obtain explicit formulae for the resistance distance between any two points of G(n). To the best of our knowledge {G(n)}(n=1)(infinity) is a nontrivial family with diameter going to infinity for which all resistance distances have been explicitly calculated. We also determine the maximal resistance distance and the minimal resistance distance in G(n). The monotonicity a...

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