期刊论文

Wang, Zhenghong

英文

中国高等学校学术文摘·数学

1673-3452

2015

10

2

339-350

10.1007/s11464-015-0446-2

Acknowledgements The authors greatly appreciate helpful suggestions of the referees that greatly improved the paper. This work was supported in part by the National Natural Science Foundation of China （Grant Nos. 11271147, 11401596）.

本校为第一机构

We study the complementary design problem, which is to express the uniformity pattern of a q-level design in terms of that of its complementary design. Here, a pair of complementary designs form a design in which all the Hamming distances of any two distinct runs are the same, and the uniformity pattern proposed by H. Qin, Z. Wang, and K. Chatterjee [J. Statist. Plann. Inference, 2012, 142: 1170–1177] comes from discrete discrepancy for q-level designs. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum...

我们学习互补设计问题，它是以它的互补设计的表示一个 q 水平图案的一致性模式。这里，一双互补图案形成任何二不同的跑的所有 Hamming 距离是一样，和 H 建议的一致性模式的一个在图案。Qin， Z. 王，和 K。Chatterjee [J。统计员。Plann。推理， 2012， 142：11701177 ] 为 q 水平图案来自分离差异。基于在一双互补图案之间的一致性模式的关系，我们建议一条最小的设计一致性规则估计并且比较 q 水平阶乘。