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TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

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成果类型:
期刊论文
作者:
Wang, Hui;Li, Yujie;Ba, Xin;Huang, Lin;Yu, Ying*
通讯作者:
Yu, Ying
作者机构:
[Wang, Hui; Ba, Xin; Yu, Ying; Huang, Lin; Li, Yujie] Cent China Normal Univ, Inst Nanosci & Nanotechnol, Coll Phys Sci & Technol, Wuhan 430079, Peoples R China.
[Wang, Hui] Wuhan Univ Sci & Technol, Hubei Prov Key Lab Syst Sci Met Proc, Wuhan 430081, Peoples R China.
通讯机构:
[Yu, Ying] C
Cent China Normal Univ, Inst Nanosci & Nanotechnol, Coll Phys Sci & Technol, Wuhan 430079, Peoples R China.
语种:
英文
关键词:
Anatase;Band gap;DC magnetron sputtering;Rutile;TiO 2 thin film
期刊:
Applied Surface Science
ISSN:
0169-4332
年:
2015
卷:
345
页码:
49-56
基金类别:
This work was financially supported by National Natural Science Foundation of China (No. 21377044 ) and Wuhan Planning Project of Science and Technology (No. 2014010101010023 ).
机构署名:
本校为第一且通讯机构
院系归属:
物理科学与技术学院
摘要:
The thin films for pure TiO 2 and that incorporated with Cu ion were deposited by DC magnetron co-sputtering with Ar gas. The crystal texture, surface morphology, energy gap and optical properties of the prepared films have been investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectrometer (XPS), UV-vis spectrophotometer, and Raman spectroscopy. The results show that as-deposited TiO 2 film mainly possesses anatase structure at room temperature with pure Ar gas, but the introduction of Cu can alte...

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