期刊论文、会议论文

Effect of sputtering parameters and underlayer on magnetic properties of SmCo thin films

中文

功能材料

1001-9731

2007

A03

150-152

第六届中国功能材料及其应用学术会议

第六届中国功能材料及其应用学术会议论文集

2007-11-15

武汉

中国仪器仪表学会<&wdkj&>中国物理学会<&wdkj&>中国光学学会

湖北省自然科学基金(2005ABA041);国家自然科学基金(60571010)

本校为第一机构

用多靶射频磁控溅射系统在玻璃基片上制备了 SmCo 磁性薄膜．并采用控制变量法研究了溅射功率、溅射时间以及溅射气压等工艺参数对薄膜磁性能的影响．结果发现,当磁性层溅射功率为60W,溅射气压为 0．5Pa,溅射时间为8min：底层溅射功率为125W,溅射气压为0．5Pa,溅射时间为4min 时,薄膜的矫顽力高达2．79×10~5．底层对 SmCo 薄膜的磁性能也有影响, 振动样品磁强计测量结果表明：

SmCo magnetic thin films were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering power , sputtering time and sputtering pressure on the magnetic properties of the thin films were investigated by the parameter control method. It is found that when the sputtering power , sputtering pressure and sputtering time of the SmCo thin films and the underlayer are 60W, 0.5Pa and 8min, 125W, 0.5Pa and 4min, respectively, the coercivity that in the plane direction is as high as 2.79 × 105 Underlayer also has effect o...