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APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS

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成果类型:
期刊论文
作者:
Shuo, Song*;Hong, Qin
通讯作者:
Shuo, Song
作者机构:
[Shuo, Song; Hong, Qin] Cent China Normal Univ, Dept Stat, Wuhan 430079, Peoples R China.
[Shuo, Song] Wuhan Univ Sci & Technol, Coll Sci, Wuhan 430065, Peoples R China.
通讯机构:
[Shuo, Song] C
Cent China Normal Univ, Dept Stat, Wuhan 430079, Peoples R China.
语种:
英文
关键词:
minimum projection uniformity;complementary design;uniformity pattern
关键词(中文):
外观设计;互补;均匀性;判据;投影;应用;定性问题;设计理论
期刊:
数学物理学报(英文版)
ISSN:
0252-9602
年:
2010
卷:
30
期:
1
页码:
180-186
基金类别:
NSF of ChinaNational Natural Science Foundation of China (NSFC) [10671080]; NCETProgram for New Century Excellent Talents in University (NCET) [06-672]; Key Project of Chinese Ministry of EducationMinistry of Education, China [105119]
机构署名:
本校为第一且通讯机构
院系归属:
数学与统计学学院
摘要:
In this article, we consider the characterization problem in design theory. The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs. Here, the complementary design means a design in which all the Hamming distances of any two runs are the same, which generalizes the concept of a pair of complementary designs in the literature. Based on relationships of the uniformity pattern between a pair of complementary designs, we propose a minimum projection unifo...

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