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Population inversion of metastable Ni atoms sputtered from Ni(100), Ni3Al(100), and NiAl(110)

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成果类型:
期刊论文
作者:
Tan, M*;King, BV
通讯作者:
Tan, M
作者机构:
[Tan, M] Univ Newcastle, Sch Math & Phys Sci, Callaghan, NSW 2308, Australia.
Cent China Normal Univ, Coll Phys Sci & Technol, Wuhan 430079, Peoples R China.
通讯机构:
[Tan, M] U
Univ Newcastle, Sch Math & Phys Sci, Callaghan, NSW 2308, Australia.
语种:
英文
期刊:
PHYSICAL REVIEW B
ISSN:
2469-9950
年:
2006
卷:
73
期:
7
页码:
075414
机构署名:
本校为其他机构
院系归属:
物理科学与技术学院
摘要:
We have measured the ratio of the population of Ni neutral atoms sputtered into the a3D3 metastable state to that into the a3F4 ground state using two-color ionization schemes. The ratio is 2.27±0.31 for Ni, 2.34±0.17 for Ni3Al, and 2.61±0.27 for NiAl. Within experimental error, we observed no effect of the valence band electron structure on the population ratio. We suggest that sputtered atoms should experience resonant neutralization and nonradiative relaxation. Before neutralization, departing Ni ions from the surface have an electron con...

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