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Photocatalytic NO removal on BiOI surface: The change from nonselective oxidation to selective oxidation

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成果类型:
期刊论文
作者:
Dong, Guohui;Ho, Wingkei*;Zhang, Lizhi
通讯作者:
Ho, Wingkei
作者机构:
[Ho, Wingkei; Dong, Guohui] Hong Kong Inst Educ, Dept Sci & Environm Studies, Tai Po, Hong Kong, Peoples R China.
[Ho, Wingkei; Dong, Guohui] Hong Kong Inst Educ, Ctr Educ Environm Sustainabil, Tai Po, Hong Kong, Peoples R China.
[Ho, Wingkei] Chinese Acad Sci, Inst Earth Environm, Beijing 100864, Peoples R China.
[Zhang, Lizhi; Dong, Guohui] Cent China Normal Univ, Coll Chem, Key Lab Pesticide & Chem Biol, Minist Educ, Wuhan 430079, Peoples R China.
通讯机构:
[Ho, Wingkei] H
Hong Kong Inst Educ, Dept Sci & Environm Studies, Tai Po, Hong Kong, Peoples R China.
语种:
英文
期刊:
Applied Catalysis B: Environmental
ISSN:
0926-3373
年:
2015
卷:
168-169
页码:
490-496
基金类别:
This research is financially supported by the research grant of Early Career Scheme (ECS 809813 ) from the Research Grant Council, Hong Kong SAR Government , Dean’s Research Fund-Early Career Researchers ( 04022 ), Research Equipment Gran t (REG-2), and Internal Research Grant (R3429) from The Hong Kong Institute of Education.
机构署名:
本校为其他机构
院系归属:
化学学院
摘要:
Numerous publications have investigated nitric oxide (NO) removal through semiconductor photocatalytic technology. However, few reports are available on the products and mechanisms of the photocatalytic NO removal process. In this study, BiOI hollow microspheres are synthesized for the photocatalytic removal of NO under the visible light irradiation. Results show that NO removal product and NO removal mechanism could interfere with each other. NO removal process could be changed from nonselective oxidation to selective oxidation as the irradiat...

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