期刊论文、会议论文

中文

华中科技大学学报(自然科学版)

1671-4512

2000

28

8

98-100

2000

10.3321/j.issn:1671-4512.2000.08.036

国家自然科学基金(59602004)

本校为其他机构

应用氧离子束辅助准分子脉冲激光沉积薄膜技术，先在不锈钢基底上室温下淀积出平面织构的钇稳锆(YSZ)缓冲层薄膜，再在YSZ/不锈钢上750℃下制备出了平面织构和高临界电流密度YBa_2Cu_3O_(7-x)(YBCO)薄膜。YSZ和YBCO薄膜都为C-轴取向和平面织构的，YSZ(202)和YBCO(103)的X射线(扫描衍射峰的全宽半峰值分别为20°和12°。YBCO薄膜的临界温度和临界电流密度分别为91K(R=0)和7.2×10~5A/cm~2(77K，无外磁场)。

High critical current density and in-plane aligned YBa2Cu3O7-x (YBCO) film was fabricated on textured yttria-stabilized zirconia (YSZ) buffer layer deposited on stainless steel tape by laser ablation only with O+ ion beam assistance. The values of X-ray Phi-scan full width at half maximum (FWHM) for YSZ (202) and YBCO (103) are 20°and 12°, respectively. The critical current density of YBCO film is 7.2×105 A/cm2 at liquid nitrogen temperature and zero field, and the critical temperature of it is 9...